Apparatus and method for providing a confined liquid for immersion lithography
US7367345B1 · kind B1 · utility
40Cited by
46References
22Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 28, 2004 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Jan 2, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.