Patent · US Expired

Semiconductor integrated circuit device and a method of manufacturing the same

US7397104B2 · kind B2 · utility

0Cited by
15References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 17, 2004
Grant dateJul 8, 2008
Priority date
Expiry dateFeb 17, 2024

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D1/716
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor integrated circuit device is provided which includes an active region, a shallow groove isolation adjacent to the active region, and a semiconductor element formed in the active region and having a gate. The sum of a width of the active region and a width of the shallow groove isolation constitutes a minimum pitch in the direction of a gate width of the gate, and the width of the active region is set larger than one-half of the minimum pitch.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.