Patent · US Active

Method to form a nonmagnetic cap for the NiFe(free) MTJ stack to enhance dR/R

US7528457B2 · kind B2 · utility

30Cited by
4References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 14, 2006
Grant dateMay 5, 2009
Priority date
Expiry dateNov 9, 2026

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N50/10

Abstract

An MTJ in an MRAM array or TMR read head is disclosed in which a capping layer has a bilayer configuration with a non-magnetic NiFeX inner layer on a NiFe free layer and a Ta layer on the NiFeX layer to improve dR/R and minimize magnetostriction. Optionally, a trilayer configuration may be employed where the Ta layer is sandwiched between an inner NiFeX layer and an outer Ru layer. The X component in NiFeX is preferably an element having an oxidation potential greater than Ni or Fe such as Mg, Hf, Zr, Nb, or Ta. NiFeX is preferably formed by co-sputtering a NiFe target with an X target at a forward power of about 200 W and 50 W, respectively. In an MRAM structure, the Mg content in NiFeMg may be increased to >50 atomic % to improve the gettering power of removing oxygen from the free layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.