Blocker plate bypass to distribute gases in a chemical vapor deposition system
US7572337B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 16, 2005 |
| Grant date | Aug 11, 2009 |
| Priority date | — |
| Expiry date | Jun 2, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32449
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed therethrough and a blocker plate having both a plurality of apertures disposed therethrough and a plurality of feed through passageways disposed therein. A first gas pathway delivers a first gas through the plurality of apertures in the blocker plate and the gas distribution plate. A bypass gas pathway delivers a second gas through the plurality of feed through passageways in the blocker plate and to areas around the blocker plate prior to the second gas passing through the gas distribution plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.