Method and system for optimizing alignment performance in a fleet of exposure tools
US7679069B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2007 |
| Grant date | Mar 16, 2010 |
| Priority date | — |
| Expiry date | Jun 28, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7046
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for optimizing alignment performance in a fleet of exposure systems involves characterizing each exposure system in a fleet of exposure systems to generate a set of distinctive distortion profiles associated with each exposure system. The set of distinctive distortion profiles are stored in a database. A wafer having reference pattern formed thereon is provided for further pattern fabrication and an exposure system is selected from the fleet to fabricate a next layer on the wafer. Linear and higher order parameters of the selected exposure system are adjusted using the distinctive distortion profiles to model the distortion of the reference pattern. Once the exposure system is adjusted, it is used to form a lithographic pattern on the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.