John Robinson
22Patents
6h-index
62Co-inventors
72Inventor score
Filing activity: Feb 13, 2003 → Apr 28, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6928628B2 | Use of overlay diagnostics for enhanced automatic process control | Physics | 75 | Expired |
| US7804994B2 | Overlay metrology and control method | Physics | 37 | Active |
| US8175831B2 | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers | Electricity | 34 | Active |
| US8111376B2 | Feedforward/feedback litho process control of stress and overlay | Physics | 19 | Active |
| US9116442B2 | Feedforward/feedback litho process control of stress and overlay | Physics | 15 | Active |
| US7310789B2 | Use of overlay diagnostics for enhanced automatic process control | Physics | 14 | Active |
| US8948495B2 | Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer | Physics | 5 | Active |
| US7111256B2 | Use of overlay diagnostics for enhanced automatic process control | Physics | 5 | Expired |
| US9903711B2 | Feed forward of metrology data in a metrology system | Physics | 4 | Active |
| US9620426B2 | Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation | Electricity | 4 | Active |
| US10466596B2 | System and method for field-by-field overlay process control using measured and estimated field parameters | Physics | 3 | Active |
| US11293970B2 | Advanced in-line part average testing | Physics | 3 | Active |
| US10409171B2 | Overlay control with non-zero offset prediction | Physics | 2 | Active |
| US8804137B2 | Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability | Electricity | 2 | Active |
| US11614480B2 | System and method for Z-PAT defect-guided statistical outlier detection of semiconductor reliability failures | Electricity | 2 | Active |
| US7679069B2 | Method and system for optimizing alignment performance in a fleet of exposure tools | Physics | 1 | Active |
| US10649447B2 | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers | Electricity | 1 | Active |
| US12422376B2 | Imaging reflectometry for inline screening | Physics | 0 | Active |
| US9651943B2 | Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers | Electricity | 0 | Active |
| US11624775B2 | Systems and methods for semiconductor defect-guided burn-in and system level tests | Electricity | 0 | Active |
| US11798827B2 | Systems and methods for semiconductor adaptive testing using inline defect part average testing | Physics | 0 | Active |
| US12332182B2 | System for automatic diagnostics and monitoring of semiconductor defect die screening performance through overlay of defect and electrical test data | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.