Patent · US Active

In-line electron beam test system

US7746088B2 · kind B2 · utility

3Cited by

105References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Fayez E. Abboud · Pleasanton, US
Sriram Krishnaswami · Saratoga, US
Benjamin M. Johnston · Los Gatos, US
Hung T. Nguyen · Fremont, US
Matthias Brunner · Tauberbischofsheim, DE
Ralf Schmid · Karlsruhe, DE
John M. White · Hayward, US
Shinichi Kurita · San Jose, US
James Craig Hunter · Los Gatos, US

Key dates

Filing date	Apr 10, 2009
Grant date	Jun 29, 2010
Priority date	—
Expiry date	Apr 10, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/2817
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A method and apparatus for testing a plurality of electronic devices formed on a large area substrate is described. In one embodiment, the apparatus performs a test on the substrate in one linear axis in at least one chamber that is slightly wider than a dimension of the substrate to be tested. Clean room space and process time is minimized due to the smaller dimensions and volume of the system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.