Methods for providing a confined liquid for immersion lithography
US7749689B2 · kind B2 · utility
9Cited by
2References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2008 |
| Grant date | Jul 6, 2010 |
| Priority date | — |
| Expiry date | Mar 25, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.