Patent · US Active

Projection lens system of a microlithographic projection exposure installation

US7782440B2 · kind B2 · utility

4Cited by

7References

4Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Helmut Beierl · Heidenheim, DE
Sascha Bleidistel · Aalen, DE
Wolfgang Singer · Aalen, DE
Toralf Gruner · Hennef (Sieg), DE
Alexander Epple · Aalen, DE
Norbert Wabra · Werneck, DE
Susanne Beder · Aalen, DE
Jochen Weber · Laufenbürg, DE
Heiko Feldmann · Aalen, DE
Baerbel Schwaer · Aalen, DE
Olaf Rogalsky · Oberkochen, DE
Ari Kazi · Aalen, DE

Key dates

Filing date	Nov 17, 2005
Grant date	Aug 24, 2010
Priority date	—
Expiry date	Aug 13, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.