Pryometer for laser annealing system compatible with amorphous carbon optical absorber layer
US7804042B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 18, 2007 |
| Grant date | Sep 28, 2010 |
| Priority date | — |
| Expiry date | Oct 11, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2101/40
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
In a laser annealing system for workpieces such as semiconductor wafers, a pyrometer wavelength response band is established within a narrow window lying between the laser emission band and a fluorescence emission band from the optical components of the laser system, the pyrometer response band lying in a wavelength region at which the optical absorber layer on the workpiece has an optical absorption coefficient as great as or greater than the underlying workpiece. A multi-layer razor-edge interference filter having a 5-8 nm wavelength cut-off edge transition provides the cut-off of the laser emission at the bottom end of the pyrometer response band.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.