Batch processing platform for ALD and CVD

US7833351B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Aaron P. Webb · Austin, US
• Adam Brailove · Gloucester, US
• Joseph Yudovsky · Campbell, US
• Nir Merry · Mountain View, US
• Andrew J. Constant · Cupertino, US
• Efrain Quiles · San Lorenzo, US
• Michael R. Rice · Pleasanton, US
• Gary J. Rosen · Arlington, US
• Vinay Shah · San Mateo, US

Key dates

• Filing date: Jun 26, 2006
• Grant date: Nov 16, 2010
• Expiry date: May 30, 2028

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S414/14
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.