In-line electron beam test system

US7973546B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Fayez E. Abboud · Pleasanton, US
• Sriram Krishnaswami · Saratoga, US
• Benjamin M. Johnston · Los Gatos, US
• Hung T. Nguyen · Fremont, US
• Matthias Brunner · Tauberbischofsheim, DE
• Ralf Schmid · Karlsruhe, DE
• John M. White · Hayward, US
• Shinichi Kurita · San Jose, US
• James Craig Hunter · Los Gatos, US

Key dates

• Filing date: Jun 29, 2010
• Grant date: Jul 5, 2011
• Expiry date: Jun 29, 2030

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/2817
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A method for testing a plurality of electronic devices formed on a large area substrate is described. In one embodiment, the method includes transferring a substrate on an end effector relative to a testing platform having a plurality of testing columns coupled thereto, the substrate having a plurality of electronic devices located thereon, and moving the substrate in a single directional axis relative to an optical axis of each of the plurality of testing columns, the single directional axis being substantially orthogonal to the optical axis to define a test area on the substrate, wherein the test area is configured to cover an entire length or an entire width of the substrate such that the testing columns are capable of testing the entire substrate as the substrate is moved through the test area.