Method and apparatus for cleaning a substrate using non-Newtonian fluids
US8043441B2 · kind B2 · utility
4Cited by
104References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2005 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | Dec 1, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for cleaning a substrate is provided. In this method, a flow of non-Newtonian fluid is provided where at least a portion of the flow exhibits plug flow. To remove particles from a surface of the substrate, the surface of the substrate is placed in contact with the portion of the flow that exhibits plug flow such that the portion of the flow exhibiting plug flow moves over the surface of the substrate. Additional methods and apparatuses for cleaning a substrate also are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.