Projection lens system of a microlithographic projection exposure installation

US8319944B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Helmut Beierl · Heidenheim, DE
• Sascha Bleidistel · Aalen, DE
• Wolfgang Singer · Aalen, DE
• Toralf Gruner · Hennef (Sieg), DE
• Alexander Epple · Aalen, DE
• Norbert Wabra · Werneck, DE
• Susanne Beder · Aalen, DE
• Jochen Weber · Laufenbürg, DE
• Heiko Feldmann · Aalen, DE
• Baerbel Schwaer · Aalen, DE
• Olaf Rogalsky · Oberkochen, DE
• Ari Kazi · Aalen, DE

Key dates

• Filing date: Jun 28, 2010
• Grant date: Nov 27, 2012
• Expiry date: Mar 26, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70891
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.