Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

US8339577B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Stefan Xalter · Oberkochen, DE
• Yim-Bun Patrick Kwan · Aalen, DE
• Andras G. Major · Oberkochen, DE
• Manfred Maul · Aalen, DE
• Johannes Eisenmenger · Ulm, DE
• Damian Fiolka · Oberkochen, DE
• Jan Horn · Munich, DE
• Markus Deguenther · Aalen, DE
• Florian Bach · Oberkochen, DE
• Michael Patra · Oberkochen, DE
• Johannes Wangler · Oberkochen, DE
• Michael Layh · Altusried, DE

Key dates

• Filing date: Jul 21, 2009
• Grant date: Dec 25, 2012
• Expiry date: Apr 20, 2031

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S359/904
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.