Apparatus and system for cleaning a substrate

US8522799B2 · kind B2 · utility

Assignee

• Lam Research Corporation · US

Inventors

• Erik M. Freer · Campbell, US
• John M. de Larios · Palo Alto, US
• Katrina Mikhaylichenko · San Jose, US
• Michael Ravkin · Sunnyvale, US
• Mikhail Korolik · San Jose, US
• Fred C. Redeker · Fremont, US
• Clint Thomas · Rhome, US
• John Parks · Hercules, US

Key dates

• Filing date: Sep 15, 2006
• Grant date: Sep 3, 2013
• Expiry date: Dec 23, 2029

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B08B3/02
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.