Method and apparatus for removing contamination from substrate

US8555903B2 · kind B2 · utility

Assignee

• Lam Research Corporation · US

Inventors

• Erik M. Freer · Campbell, US
• John M. de Larios · Palo Alto, US
• Katrina Mikhaylichenko · San Jose, US
• Michael Ravkin · Sunnyvale, US
• Mikhail Korolik · San Jose, US
• Fred C. Redeker · Fremont, US
• Clint Thomas · Rhome, US
• John Parks · Hercules, US

Key dates

• Filing date: Nov 17, 2009
• Grant date: Oct 15, 2013
• Expiry date: Apr 12, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/42
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

A cleaning material is disposed over a substrate. The cleaning material includes solid components dispersed within a liquid medium. A force is applied to the solid components within the liquid medium to bring the solid components within proximity to contaminants present on the substrate. The force applied to the solid components can be exerted by an immiscible component within the liquid medium. When the solid components are brought within sufficient proximity to the contaminants, an interaction is established between the solid components and the contaminants. Then, the solid components are moved away from the substrate such that the contaminants having interacted with the solid components are removed from the substrate.