Illumination system for microlithography

US8873023B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Axel Scholz · Aalen, DE
• Frank Schlesener · Oberkochen, DE
• Nils Haverkamp · Aalen, DE
• Vladimir Davydenko · Bad Herrenalb, DE
• Michael Gerhard · Aalen, DE
• Gerhard-Wilhelm Ziegler · Aalen, DE
• Mirco Kern · Eppelheim, DE
• Thomas C. Bischoff · Buxtehude, DE
• Thomas Stammler · Aalen, DE
• Stephan Kellner · Lauchheim, DE
• Manfred Maul · Aalen, DE
• Daniel Walldorf · Frankfurt, DE
• Igor Hurevich · Riegelsberg, DE
• Markus Deguenther · Aalen, DE

Key dates

• Filing date: Jul 19, 2011
• Grant date: Oct 28, 2014
• Expiry date: Jun 27, 2033

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70083
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual dista…