Flow control features of CVD chambers

US8894767B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Kien N. Chuc · Cupertino, US
• Qiwei Liang · Fremont, US
• Hanh Nguyen · San Jose, US
• Xinglong Chen · Ürümqi, CN
• Matthew L. Miller · Houston, US
• Soonam Park · Sunnyvale, US
• Toan Q. Tran · San Jose, US
• Adib Khan · Santa Clara, US
• Jang-Gyoo Yang · San Jose, US
• Dmitry Lubomirsky · Cupertino, US
• Shankar Venkataraman · Santa Clara, US

Key dates

• Filing date: Jul 15, 2010
• Grant date: Nov 25, 2014
• Expiry date: Mar 3, 2033

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T137/85938
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.