Inventor · Ürümqi, CN

Xinglong Chen

56Patents
23h-index
82Co-inventors
87Inventor score

Filing activity: Feb 2, 2007 → Sep 24, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US9153442B2 Processing systems and methods for halide scavenging Electricity 217 Active
US9132436B2 Chemical control features in wafer process equipment Electricity 197 Active
US9023732B2 Processing systems and methods for halide scavenging Electricity 184 Active
US9093371B2 Processing systems and methods for halide scavenging Electricity 183 Active
US8969212B2 Dry-etch selectivity Electricity 182 Active
US9144147B2 Semiconductor processing system and methods using capacitively coupled plasma Electricity 182 Active
US9184055B2 Processing systems and methods for halide scavenging Electricity 178 Active
US9384997B2 Dry-etch selectivity Electricity 145 Active
US9362130B2 Enhanced etching processes using remote plasma sources Electricity 137 Active
US9373517B2 Semiconductor processing with DC assisted RF power for improved control Electricity 135 Active
US9449850B2 Processing systems and methods for halide scavenging Electricity 134 Active
US9659792B2 Processing systems and methods for halide scavenging Electricity 121 Active
US9704723B2 Processing systems and methods for halide scavenging Electricity 114 Active
US8894767B2 Flow control features of CVD chambers Emerging Cross-Sectional Technologies 105 Active
US9978564B2 Chemical control features in wafer process equipment Electricity 105 Active
US9991134B2 Processing systems and methods for halide scavenging Electricity 100 Active
US10062587B2 Pedestal with multi-zone temperature control and multiple purge capabilities Electricity 95 Active
US10032606B2 Semiconductor processing with DC assisted RF power for improved control Electricity 94 Active
US9593421B2 Particle generation suppressor by DC bias modulation Electricity 55 Active
US9267739B2 Pedestal with multi-zone temperature control and multiple purge capabilities Electricity 52 Active
US10256079B2 Semiconductor processing systems having multiple plasma configurations Electricity 39 Active
US10354843B2 Chemical control features in wafer process equipment Electricity 38 Active
US10283321B2 Semiconductor processing system and methods using capacitively coupled plasma Electricity 35 Active
US9892888B2 Particle generation suppresor by DC bias modulation Electricity 23 Active
US9502218B2 RPS assisted RF plasma source for semiconductor processing Electricity 7 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.