Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

US9001309B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Stefan Xalter · Oberkochen, DE
• Yim-Bun Patrick Kwan · Aalen, DE
• Andras G. Major · Oberkochen, DE
• Manfred Maul · Aalen, DE
• Johannes Eisenmenger · Ulm, DE
• Damian Fiolka · Oberkochen, DE
• Jan Horn · Munich, DE
• Markus Deguenther · Aalen, DE
• Florian Bach · Oberkochen, DE
• Michael Patra · Oberkochen, DE
• Johannes Wangler · Oberkochen, DE
• Michael Layh · Altusried, DE

Key dates

• Filing date: Apr 17, 2014
• Grant date: Apr 7, 2015
• Expiry date: Apr 17, 2034

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S359/904
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.