Metrology systems and methods

US9080971B2 · kind B2 · utility

Assignee

• KLA-TENCOR CORPORATION · US

Inventors

• Daniel Kandel · Aseret, IL
• Vladimir Levinski · Milpitas, US
• Alexander Svizher · Haifa, IL
• Joel Seligson · Kiryat Shmona, IL
• Andrew V. Hill · Chino Hills, US
• Ohad Bachar · Timrat, IL
• Amnon Manassen · Haifa, IL
• Yung-Ho Alex Chuang · Cupertino, US
• Ilan Sela · Haifa, IL
• Moshe Markowitz · Haifa, IL
• Daria Negri · Nesher, IL
• Efraim Rotem · Hod HaSharon, IL

Key dates

• Filing date: Oct 16, 2014
• Grant date: Jul 14, 2015
• Expiry date: Oct 16, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2201/105
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.