Patent · US Active

E-fuse structures and methods of manufacture

US9142506B2 · kind B2 · utility

7Cited by
8References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 13, 2013
Grant dateSep 22, 2015
Priority date
Expiry dateDec 14, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

E-fuse structures in back end of the line (BEOL) interconnects and methods of manufacture are provided. The method includes forming an interconnect via in a substrate in alignment with a first underlying metal wire and forming an e-fuse via in the substrate, exposing a second underlying metal wire. The method further includes forming a defect with the second underlying metal wire and filling the interconnect via with metal and in contact with the first underlying metal wire thereby forming an interconnect structure. The method further includes filling the e-fuse via with the metal and in contact with the defect and the second underlying metal wire thereby forming an e-fuse structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.