Patent · US Active

Projection lens system of a microlithographic projection exposure installation

US9164396B2 · kind B2 · utility

0Cited by

9References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Helmut Beierl · Heidenheim, DE
Sascha Bleidistel · Aalen, DE
Wolfgang Singer · Aalen, DE
Toralf Gruner · Hennef (Sieg), DE
Alexander Epple · Aalen, DE
Norbert Wabra · Werneck, DE
Susanne Beder · Aalen, DE
Jochen Weber · Laufenbürg, DE
Heiko Feldmann · Aalen, DE
Baerbel Schwaer · Aalen, DE
Olaf Rogalsky · Oberkochen, DE
Arif Kazi · Aalen, DE

Key dates

Filing date	Oct 25, 2012
Grant date	Oct 20, 2015
Priority date	—
Expiry date	Feb 14, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.