Illumination system for microlithography

US9280060B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Axel Scholz · Aalen, DE
• Frank Schlesener · Oberkochen, DE
• Nils Haverkamp · Aalen, DE
• Vladimir Davydenko · Bad Herrenalb, DE
• Michael Gerhard · Aalen, DE
• Gerhard-Wilhelm Ziegler · Aalen, DE
• Mirco Kern · Eppelheim, DE
• Thomas C. Bischoff · Buxtehude, DE
• Thomas Stammler · Aalen, DE
• Stephan Kellner · Lauchheim, DE
• Manfred Maul · Aalen, DE
• Daniel Walldorf · Frankfurt, DE
• Igor Hurevich · Riegelsberg, DE
• Markus Deguenther · Aalen, DE

Key dates

• Filing date: Sep 25, 2014
• Grant date: Mar 8, 2016
• Expiry date: Sep 25, 2034

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70083
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.