Process load lock apparatus, lift assemblies, electronic device processing systems, and methods of processing substrates in load lock locations
US9355876B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2014 |
| Grant date | May 31, 2016 |
| Priority date | — |
| Expiry date | Mar 10, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49998
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process load lock apparatus is disclosed. The process load lock apparatus includes a load lock chamber adapted to couple between a mainframe section and a factory interface, the load lock chamber including an entry and an exit each having a slit valve, and a load lock process chamber located at a different level than the load lock chamber at the load lock location wherein the load lock process chamber is adapted to carry out a process on a substrate, such as oxide removal or other processes. Systems including the process load lock apparatus and methods of operating the process load lock apparatus are provided. A lift assembly including a containment ring is also disclosed, as are numerous other aspects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.