Illumination system for microlithography

US9606441B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Axel Scholz · Aalen, DE
• Frank Schlesener · Oberkochen, DE
• Nils Haverkamp · Aalen, DE
• Vladimir Davydenko · Bad Herrenalb, DE
• Michael Gerhard · Aalen, DE
• Gerhard-Wilhelm Ziegler · Aalen, DE
• Mirco Kern · Eppelheim, DE
• Thomas C. Bischoff · Buxtehude, DE
• Thomas Stammler · Aalen, DE
• Stephan Kellner · Lauchheim, DE
• Manfred Maul · Aalen, DE
• Daniel Walldorf · Frankfurt, DE
• Igor Hurevich · Riegelsberg, DE
• Markus Deguenther · Aalen, DE

Key dates

• Filing date: Feb 1, 2016
• Grant date: Mar 28, 2017
• Expiry date: Feb 1, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70083
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements.