Patent · US Active

Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles

US9776361B2 · kind B2 · utility

20Cited by
34References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 23, 2015
Grant dateOct 3, 2017
Priority date
Expiry dateSep 23, 2035

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29L2031/736
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.