Gregory E. Menk
32Patents
12h-index
65Co-inventors
84Inventor score
Filing activity: Aug 10, 1988 → Dec 8, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9873180B2 | CMP pad construction with composite material properties using additive manufacturing processes | Performing Operations; Transporting | 37 | Active |
| US9776361B2 | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles | Performing Operations; Transporting | 20 | Active |
| US10384330B2 | Polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 20 | Active |
| US10593574B2 | Techniques for combining CMP process tracking data with 3D printed CMP consumables | Electricity | 17 | Active |
| US7553214B2 | Polishing article with integrated window stripe | Performing Operations; Transporting | 16 | Active |
| US10537974B2 | CMP pad construction with composite material properties using additive manufacturing processes | Performing Operations; Transporting | 16 | Active |
| US10875145B2 | Polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 16 | Active |
| US10821573B2 | Polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 16 | Active |
| US10322491B2 | Printed chemical mechanical polishing pad | Performing Operations; Transporting | 15 | Active |
| US7063597B2 | Polishing processes for shallow trench isolation substrates | Electricity | 15 | Expired |
| US10493691B2 | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles | Performing Operations; Transporting | 15 | Active |
| US9138860B2 | Closed-loop control for improved polishing pad profiles | Performing Operations; Transporting | 14 | Active |
| US8439723B2 | Chemical mechanical polisher with heater and method | Performing Operations; Transporting | 12 | Active |
| US8388412B2 | Retaining ring with shaped profile | Emerging Cross-Sectional Technologies | 11 | Active |
| US7601050B2 | Polishing apparatus with grooved subpad | Performing Operations; Transporting | 10 | Active |
| US4994868A | Heterojunction confined channel FET | Electricity | 8 | Expired |
| US4962050A | GaAs FET manufacturing process employing channel confining layers | Emerging Cross-Sectional Technologies | 8 | Expired |
| US4948752A | Method of making sagfets on buffer layers | Emerging Cross-Sectional Technologies | 7 | Expired |
| US4918493A | Sagfet with buffer layers | Electricity | 5 | Expired |
| US7179159B2 | Materials for chemical mechanical polishing | Performing Operations; Transporting | 5 | Expired |
| US8033895B2 | Retaining ring with shaped profile | Emerging Cross-Sectional Technologies | 4 | Active |
| US7429210B2 | Materials for chemical mechanical polishing | Performing Operations; Transporting | 3 | Active |
| US11724362B2 | Polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 3 | Active |
| US8337279B2 | Closed-loop control for effective pad conditioning | Performing Operations; Transporting | 2 | Active |
| US8758085B2 | Method for compensation of variability in chemical mechanical polishing consumables | Performing Operations; Transporting | 2 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.