Feed forward of metrology data in a metrology system

US9903711B2 · kind B2 · utility

Assignee

• KLA-TENCOR CORPORATION · US

Inventors

• Ady Levy · Sunnyvale, US
• Daniel Kandel · Aseret, IL
• Michael Adel · Zichron Ya'akov, IL
• Leonid Poslavsky · Belmont, US
• John Robinson · Austin, US
• Tal Marciano · Haifa, IL
• Barak Bringoltz · Rehovot, IL
• Tzahi Grunzweig · Hillsboro, US
• Dana Klein · Haifa, IL
• Tal Itzkovich · Bet Shemesh, IL
• Nadav Carmel · Mevaseret Tsiyon, IL
• Nuriel Amir · Yoqneam Illit, IL
• Vidya Ramanathan · Milpitas, US
• Janay Camp · Ballston Spa, US
• Mark Wagner · Rehovot, IL

Key dates

• Filing date: Apr 4, 2016
• Grant date: Feb 27, 2018
• Expiry date: Apr 4, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2021/213
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.