Self-aligned quadruple patterning (SAQP) for routing layouts including multi-track jogs

US9991156B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Sean D. Burns · Yorktown Heights, US
• Lawrence A. Clevenger · Saratoga Springs, US
• Matthew E. Colburn · Hopewell Junction, US
• Sivananda K. Kanakasabapathy · Niskayuna, US
• Yann Mignot · Slingerlands, US
• Christopher J. Penny · Saratoga Springs, US
• Roger A. Quon · Austin, US
• Nicole Saulnier · Albany, US

Key dates

• Filing date: Jun 3, 2016
• Grant date: Jun 5, 2018
• Expiry date: Jun 3, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/76892
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

An interconnect structure having a pitch of less than 40 nanometers and a self-aligned quadruple patterning process for forming the interconnect structure includes three types of lines: a β line defined by a patterned bottom mandrel formed in the self-aligned quadruple patterning process; a γ line defined by location underneath a top mandrel formed in the self-aligned quadruple patterning process; and an α line defined by elimination located underneath neither the top mandrel or the bottom mandrel formed in the self-aligned quadruple patterning process. The interconnect structure further includes multi-track jogs selected from a group consisting of a βγβ jog; a βαβ jog; an αβγ jog; a γβα jog, and combinations thereof. The first and third positions refer to the uncut line and the second position refers to the cut line in the self-aligned quadruple patterning process.