Torrex Equipment
10Patents
0Active
10Granted
30Portfolio score
Filing activity: Jun 4, 1992 → Sep 10, 2001
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6321680A | Vertical plasma enhanced process apparatus and method | Electricity | 467 | Expired |
| US5551985A | Method and apparatus for cold wall chemical vapor deposition | Chemistry; Metallurgy | 80 | Expired |
| US6352593B1 | Mini-batch process chamber | Electricity | 43 | Expired |
| USRE36957E | Method and apparatus for cold wall chemical vapor deposition | General | 17 | Expired |
| US6287635A | High rate silicon deposition method at low pressures | Electricity | 17 | Expired |
| US6167837A | Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor | Electricity | 14 | Expired |
| US6506691B2 | High rate silicon nitride deposition method at low pressures | Electricity | 11 | Expired |
| US5291030A | Optoelectronic detector for chemical reactions | Physics | 10 | Expired |
| US6780464B2 | Thermal gradient enhanced CVD deposition at low pressure | Electricity | 4 | Expired |
| US6235652A | High rate silicon dioxide deposition at low pressures | Electricity | 2 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.