Boyi Fu
27Patents
10h-index
41Co-inventors
67Inventor score
Filing activity: Oct 16, 2015 → Dec 18, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10211072B2 | Method of reconstituted substrate formation for advanced packaging applications | Electricity | 32 | Active |
| US10384330B2 | Polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 20 | Active |
| US10456886B2 | Porous chemical mechanical polishing pads | Performing Operations; Transporting | 20 | Active |
| US10399201B2 | Advanced polishing pads having compositional gradients by use of an additive manufacturing process | Performing Operations; Transporting | 20 | Active |
| US10391605B2 | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process | Performing Operations; Transporting | 17 | Active |
| US10618141B2 | Apparatus for forming a polishing article that has a desired zeta potential | Electricity | 17 | Active |
| US10821573B2 | Polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 16 | Active |
| US10875145B2 | Polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 16 | Active |
| US10953515B2 | Apparatus and method of forming a polishing pads by use of an additive manufacturing process | Performing Operations; Transporting | 15 | Active |
| US10875153B2 | Advanced polishing pad materials and formulations | Performing Operations; Transporting | 15 | Active |
| US10032827B2 | Systems and methods for transfer of micro-devices | Electricity | 8 | Active |
| US11724362B2 | Polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 3 | Active |
| US11745302B2 | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process | Performing Operations; Transporting | 3 | Active |
| US10692923B2 | Systems and methods for transfer of micro-devices | Electricity | 2 | Active |
| US11251226B2 | Systems and methods for transfer of micro-devices | Electricity | 1 | Active |
| US11446788B2 | Precursor formulations for polishing pads produced by an additive manufacturing process | Performing Operations; Transporting | 1 | Active |
| US11644617B1 | Systems having fibers with antireflection coatings | Physics | 0 | Active |
| US11685014B2 | Formulations for advanced polishing pads | Performing Operations; Transporting | 0 | Active |
| US11471999B2 | Integrated abrasive polishing pads and manufacturing methods | Electricity | 0 | Active |
| US11826876B2 | Hydrophilic and zeta potential tunable chemical mechanical polishing pads | Emerging Cross-Sectional Technologies | 0 | Active |
| US11843025B2 | Methods for transfer of micro-devices | Electricity | 0 | Active |
| US12157289B2 | Seals for optical components | Physics | 0 | Active |
| US11980992B2 | Integrated abrasive polishing pads and manufacturing methods | Electricity | 0 | Active |
| US11772229B2 | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process | Performing Operations; Transporting | 0 | Active |
| US12332430B2 | Seals for optical components | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.