C. Robert Koemtzopoulos
11Patents
6h-index
17Co-inventors
59Inventor score
Filing activity: Jul 9, 1996 → Oct 1, 2009
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6303044A | Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers | Emerging Cross-Sectional Technologies | 179 | Expired |
| US6017414A | Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers | Emerging Cross-Sectional Technologies | 154 | Expired |
| US6071573A | Process for precoating plasma CVD reactors | Emerging Cross-Sectional Technologies | 68 | Expired |
| US6016766A | Microwave plasma processor | Electricity | 27 | Expired |
| US5911833A | Method of in-situ cleaning of a chuck within a plasma chamber | Emerging Cross-Sectional Technologies | 25 | Expired |
| US5988187A | Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports | Electricity | 13 | Expired |
| US7682985B2 | Dual doped polysilicon and silicon germanium etch | Electricity | 5 | Active |
| US7425277B1 | Method for hard mask CD trim | Electricity | 2 | Expired |
| US7951616B2 | Process for wafer temperature verification in etch tools | Electricity | 1 | Active |
| USRE38097E1 | Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports | General | 0 | Expired |
| US7667281B2 | Method for hard mask CD trim | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.