Carl E. Larson
19Patents
8h-index
30Co-inventors
72Inventor score
Filing activity: Feb 17, 1987 → Nov 4, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5096737A | Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal thin films | Electricity | 51 | Expired |
| US5220044A | Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal thin films | Electricity | 31 | Expired |
| US6806026B2 | Photoresist composition | Emerging Cross-Sectional Technologies | 29 | Expired |
| US4760013A | Sulfonium salt photoinitiators | Emerging Cross-Sectional Technologies | 14 | Expired |
| US9255194B2 | Methods and materials for depolymerizing polyesters | Emerging Cross-Sectional Technologies | 12 | Active |
| US5407710A | Laser interconnection of circuits on transparent substrate | Physics | 11 | Expired |
| US9914816B2 | Methods and materials for depolymerizing polyesters | Emerging Cross-Sectional Technologies | 10 | Active |
| US4775608A | Generation of capacitive servo patterns on magnetic storage disks | Physics | 8 | Expired |
| US7014980B2 | Photoresist composition | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7288362B2 | Immersion topcoat materials with improved performance | Emerging Cross-Sectional Technologies | 4 | Expired |
| US7585609B2 | Bilayer film including an underlayer having vertical acid transport properties | Physics | 3 | Active |
| US8945808B2 | Self-topcoating resist for photolithography | Physics | 3 | Active |
| US7767385B2 | Method for lithography for optimizing process conditions | Physics | 3 | Active |
| US7160665B2 | Method for employing vertical acid transport for lithographic imaging applications | Physics | 2 | Expired |
| US7135595B2 | Photoresist composition | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7855045B2 | Immersion topcoat materials with improved performance | Emerging Cross-Sectional Technologies | 1 | Active |
| US8034532B2 | High contact angle topcoat material and use thereof in lithography process | Emerging Cross-Sectional Technologies | 1 | Active |
| US7354692B2 | Photoresists for visible light imaging | Emerging Cross-Sectional Technologies | 0 | Expired |
| US7807340B2 | Photoresists for visible light imaging | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.