Chris Auth
7Patents
7h-index
13Co-inventors
56Inventor score
Filing activity: May 21, 2003 → Aug 7, 2012
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7045407B2 | Amorphous etch stop for the anisotropic etching of substrates | Electricity | 111 | Expired |
| US7335959B2 | Device with stepped source/drain region profile | Electricity | 75 | Expired |
| US8258057B2 | Copper-filled trench contact for transistor performance improvement | Electricity | 49 | Active |
| US7129139B2 | Methods for selective deposition to improve selectivity | Electricity | 19 | Expired |
| US7358547B2 | Selective deposition to improve selectivity and structures formed thereby | Electricity | 17 | Expired |
| US7045408B2 | Integrated circuit with improved channel stress properties and a method for making it | Electricity | 14 | Expired |
| US8766372B2 | Copper-filled trench contact for transistor performance improvement | Electricity | 13 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.