Darin Bivens
11Patents
5h-index
11Co-inventors
55Inventor score
Filing activity: May 3, 2006 → Mar 10, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7909961B2 | Method and apparatus for photomask plasma etching | Electricity | 17 | Active |
| US7520999B2 | Method of processing a workpiece in a plasma reactor with dynamic adjustment of the plasma source power applicator and the workpiece relative to one another | Electricity | 16 | Active |
| US7943005B2 | Method and apparatus for photomask plasma etching | Electricity | 10 | Active |
| US7504041B2 | Method of processing a workpiece in a plasma reactor employing a dynamically adjustable plasma source power applicator | Electricity | 6 | Active |
| US7967930B2 | Plasma reactor for processing a workpiece and having a tunable cathode | Electricity | 6 | Active |
| US8002946B2 | Mask etch plasma reactor with cathode providing a uniform distribution of etch rate | Electricity | 5 | Active |
| US7419551B2 | Plasma reactor with apparatus for dynamically adjusting the plasma source power applicator and the workpiece relative to one another | Electricity | 3 | Active |
| US7964818B2 | Method and apparatus for photomask etching | Chemistry; Metallurgy | 3 | Active |
| US7431797B2 | Plasma reactor with a dynamically adjustable plasma source power applicator | Electricity | 2 | Active |
| US8012366B2 | Process for etching a transparent workpiece including backside endpoint detection steps | Electricity | 2 | Active |
| US8568553B2 | Method and apparatus for photomask plasma etching | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.