Inventor · New York, NY, US

David Blumel

8Patents
8h-index
6Co-inventors
58Inventor score

Filing activity: Jun 3, 1985 → Sep 14, 1999

Most-cited inventions

PatentTitleAreaCited byStatus
US4672021A Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder Physics 106 Expired
US6228678A Flip chip with integrated mask and underfill Electricity 68 Expired
US6228681A Flip chip having integral mask and underfill providing two-stage bump formation Electricity 43 Expired
US6194788A Flip chip with integrated flux and underfill Emerging Cross-Sectional Technologies 36 Expired
US5571340A Rosin-free, low VOC, no-clean soldering flux and method using the same Performing Operations; Transporting 26 Expired
US5297721A No-clean soldering flux and method using the same Performing Operations; Transporting 24 Expired
US4777111A Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element Physics 12 Expired
US6323062A Wafer coating method for flip chips Electricity 10 Expired

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.