David Deckers
22Patents
4h-index
52Co-inventors
62Inventor score
Filing activity: Mar 9, 2011 → Aug 10, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9946165B2 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Physics | 13 | Active |
| US10274834B2 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Physics | 10 | Active |
| US8982347B2 | Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus | Physics | 5 | Active |
| US10642162B2 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Physics | 4 | Active |
| US9046385B2 | Alignment measurement system, lithographic apparatus, and a method to determine alignment in a lithographic apparatus | Physics | 4 | Active |
| US11054813B2 | Method and apparatus for controlling an industrial process using product grouping | Emerging Cross-Sectional Technologies | 2 | Active |
| US10191390B2 | Method for transferring a mark pattern to a substrate, a calibration method, and a lithographic apparatus | Physics | 1 | Active |
| US10996573B2 | Method and system for increasing accuracy of pattern positioning | Physics | 1 | Active |
| US10151987B2 | Measuring method, apparatus and substrate | Physics | 1 | Active |
| US11940740B2 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Physics | 1 | Active |
| US9927717B2 | Inspection method and apparatus, and lithographic apparatus | Physics | 1 | Active |
| US10915689B2 | Method and apparatus to correct for patterning process error | Physics | 0 | Active |
| US11782349B2 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Physics | 0 | Active |
| US11592753B2 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Physics | 0 | Active |
| US11754931B2 | Method for determining corrections for lithographic apparatus | Physics | 0 | Active |
| US11385550B2 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Physics | 0 | Active |
| US11327407B2 | Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatus | Physics | 0 | Active |
| US9025148B2 | Alignment mark, substrate, set of patterning devices, and device manufacturing method | Physics | 0 | Active |
| US9280057B2 | Alignment measurement system, lithographic apparatus, and a method to determine alignment of in a lithographic apparatus | Physics | 0 | Active |
| US10877381B2 | Methods of determining corrections for a patterning process | Physics | 0 | Active |
| US12287584B2 | Methods and apparatus for obtaining diagnostic information relating to an industrial process | Physics | 0 | Active |
| US12366809B2 | Methods and apparatus for controlling a lithographic process | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.