Inventor · Gières, FR

Dominique Golanski

8Patents
1h-index
16Co-inventors
48Inventor score

Filing activity: Oct 26, 2001 → Feb 27, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US9786755B2 Process for producing, from an SOI and in particular an FDSOI type substrate, transistors having gate oxides of different thicknesses, and corresponding integrated circuit Electricity 2 Active
US9876032B2 Method of manufacturing a device with MOS transistors Electricity 0 Active
US11581449B2 Single-photon avalanche photodiode Emerging Cross-Sectional Technologies 0 Active
US11949035B2 Integrated circuit comprising a single photon avalanche diode and corresponding manufacturing method Electricity 0 Active
US12324250B2 Single-photon avalanche photodiode Emerging Cross-Sectional Technologies 0 Active
US12087873B2 SPAD photodiode Electricity 0 Active
US7015105B2 Method of simultaneously making a pair of transistors with insulated gates having respectively a thin oxide and a thick oxide, and corresponding integrated circuit comprising such a pair of transistors Electricity 0 Expired
US12324251B2 Integrated circuit comprising a single photon avalanche diode and corresponding manufacturing method Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.