E. Todd Ryan
12Patents
5h-index
20Co-inventors
62Inventor score
Filing activity: Jul 31, 2003 → Feb 28, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6919636B1 | Interconnects with a dielectric sealant layer | Electricity | 54 | Expired |
| US7557035B1 | Method of forming semiconductor devices by microwave curing of low-k dielectric films | Electricity | 22 | Active |
| US7737052B2 | Advanced multilayer dielectric cap with improved mechanical and electrical properties | Electricity | 20 | Active |
| US8470706B2 | Methods to mitigate plasma damage in organosilicate dielectrics | Electricity | 7 | Active |
| US8481423B2 | Methods to mitigate plasma damage in organosilicate dielectrics | Electricity | 6 | Active |
| US9040411B2 | Advanced low k cap film formation process for nano electronic devices | Electricity | 4 | Active |
| US8592312B2 | Method for depositing a conductive capping layer on metal lines | Electricity | 2 | Active |
| US8212346B2 | Method and apparatus for reducing semiconductor package tensile stress | Electricity | 2 | Active |
| US8212337B2 | Advanced low k cap film formation process for nano electronic devices | Electricity | 1 | Active |
| US7998856B2 | Interconnects with a dielectric sealant layer | Electricity | 1 | Active |
| US8324093B2 | Methods for fabricating semiconductor devices including azeotropic drying processes | Electricity | 0 | Active |
| US8664109B2 | Advanced low k cap film formation process for nano electronic devices | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.