Ji Cui
38Patents
5h-index
71Co-inventors
72Inventor score
Filing activity: Mar 15, 2002 → May 5, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6867318B1 | Composition for coating of aluminum | Chemistry; Metallurgy | 14 | Expired |
| US6939625B2 | Organic light-emitting diodes and methods for assembly and enhanced charge injection | Emerging Cross-Sectional Technologies | 13 | Expired |
| US9188284B2 | Natural gas adsorption devices | Mechanical Engineering; Lighting; Heating | 9 | Active |
| US7911029B2 | Multilayer electronic devices for imbedded capacitor | Electricity | 8 | Active |
| US8372999B2 | Organically modified silica and use thereof | Emerging Cross-Sectional Technologies | 6 | Active |
| US8106229B2 | Organically modifid silica and use thereof | Emerging Cross-Sectional Technologies | 4 | Active |
| US8057918B2 | Organic light-emitting diodes and methods for assembly and enhanced charge injection | Emerging Cross-Sectional Technologies | 3 | Active |
| US8029752B2 | Approach in controlling DSP scale in bayer process | Chemistry; Metallurgy | 2 | Active |
| US7862862B2 | Water dispersible silanes as corrosion-protection coatings and paint primers for metal pretreatment | Performing Operations; Transporting | 2 | Active |
| US8545776B2 | Reducing aluminosilicate scale in the Bayer process | Chemistry; Metallurgy | 1 | Active |
| US8889096B2 | Reducing aluminosilicate scale in the bayer process | Chemistry; Metallurgy | 1 | Active |
| US10619075B2 | Self-stopping polishing composition and method for bulk oxide planarization | Electricity | 1 | Active |
| US8455673B2 | Water dispersible silanes | Performing Operations; Transporting | 1 | Active |
| US8623766B2 | Composition and method for polishing aluminum semiconductor substrates | Electricity | 1 | Active |
| US11679469B2 | Chemical mechanical planarization tool | Performing Operations; Transporting | 1 | Active |
| US10920107B2 | Self-stopping polishing composition and method for bulk oxide planarization | Electricity | 1 | Active |
| US11772228B2 | Chemical mechanical polishing apparatus including a multi-zone platen | Electricity | 1 | Active |
| US10619076B2 | Self-stopping polishing composition and method for bulk oxide planarization | Electricity | 1 | Active |
| US8282834B2 | Di- and mono-alkoxysilane functionalized polymers and their application in the Bayer process | Chemistry; Metallurgy | 1 | Active |
| US11260495B2 | Apparatus and methods for chemical mechanical polishing | Electricity | 0 | Active |
| US11597854B2 | Method to increase barrier film removal rate in bulk tungsten slurry | Chemistry; Metallurgy | 0 | Active |
| US12131944B2 | Slurry composition, semiconductor structure and method for forming the same | Electricity | 0 | Active |
| US11450565B2 | Ion implant process for defect elimination in metal layer planarization | Electricity | 0 | Active |
| US8501010B2 | Di- and mono-alkoxysilane functionalized polymers and their application in the Bayer process | Chemistry; Metallurgy | 0 | Active |
| US12068169B2 | Semiconductor processing tool and methods of operation | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.