Jin-Ho Do
8Patents
2h-index
9Co-inventors
33Inventor score
Filing activity: Apr 25, 2011 → Jan 28, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8563411B2 | Semiconductor devices having a diffusion barrier layer and methods of manufacturing the same | Electricity | 4 | Active |
| US8877579B2 | Methods of manufacturing semiconductor devices | Electricity | 2 | Active |
| US8815673B2 | Methods of forming MOSFET devices using nitrogen-injected oxide layers to form gate insulating layers having different thicknesses | Electricity | 2 | Active |
| US8963227B2 | Semiconductor devices having a diffusion barrier layer and methods of manufacturing the same | Electricity | 1 | Active |
| US8673747B2 | Method of fabricating semiconductor device | Electricity | 0 | Active |
| US8455345B2 | Methods of forming gate structure and methods of manufacturing semiconductor device including the same | Electricity | 0 | Active |
| US9023718B2 | Method of fabricating semiconductor device | Electricity | 0 | Active |
| US8664111B2 | Method of patterning a semiconductor device with hard mask | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.