Jun Xue
31Patents
5h-index
72Co-inventors
68Inventor score
Filing activity: Nov 19, 2008 → Dec 28, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9502258B2 | Anisotropic gap etch | Electricity | 129 | Active |
| US9190290B2 | Halogen-free gas-phase silicon etch | Electricity | 97 | Active |
| US9412613B2 | Development of high etch selective hardmask material by ion implantation into amorphous carbon films | Electricity | 49 | Active |
| US9777378B2 | Advanced process flow for high quality FCVD films | Chemistry; Metallurgy | 17 | Active |
| US11314168B2 | Underlayer for photoresist adhesion and dose reduction | Electricity | 12 | Active |
| US8278072B1 | Method for synthesis of sialylated products using reversible sialylation | Chemistry; Metallurgy | 5 | Active |
| US9502262B2 | Nanocrystalline diamond carbon film for 3D NAND hardmask application | Electricity | 4 | Active |
| US8074739B2 | Sampling method and sampler for gas hydrates by hole bottom freezing | Fixed Constructions | 3 | Active |
| US10096466B2 | Pulsed plasma for film deposition | Electricity | 3 | Active |
| US9620407B2 | 3D material modification for advanced processing | Electricity | 3 | Active |
| US9852902B2 | Material deposition for high aspect ratio structures | Electricity | 2 | Active |
| US11988965B2 | Underlayer for photoresist adhesion and dose reduction | Electricity | 2 | Active |
| US9865464B2 | Nanocrystalline diamond carbon film for 3D NAND hardmask application | Electricity | 2 | Active |
| US9619107B2 | Methods and systems for dynamically displaying icons on a user interface for security check and other functions | Physics | 2 | Active |
| US11521860B2 | Selectively etching for nanowires | Electricity | 0 | Active |
| US10276369B2 | Material deposition for high aspect ratio structures | Electricity | 0 | Active |
| US12222823B2 | User data backup to data partition of storage medium | Physics | 0 | Active |
| US11360696B2 | System startup method and apparatus, electronic device, and storage medium | Physics | 0 | Active |
| US9534289B2 | Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methods | Electricity | 0 | Active |
| US10152546B2 | Method, system and terminal for performing search in a browser | Physics | 0 | Active |
| US9595467B2 | Air gap formation in interconnection structure by implantation process | Electricity | 0 | Active |
| US9773675B2 | 3D material modification for advanced processing | Electricity | 0 | Active |
| US12187838B2 | Preparation method of self-thixotropic polyurethane curing agent, self-thixotropic polyurethane curing agent and application thereof | Chemistry; Metallurgy | 0 | Active |
| US9520267B2 | Bias voltage frequency controlled angular ion distribution in plasma processing | Electricity | 0 | Active |
| US9382625B2 | Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.