Karsten Moh
16Patents
2h-index
24Co-inventors
50Inventor score
Filing activity: Nov 23, 2011 → Sep 9, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10586725B1 | Method for polymer-assisted chip transfer | Electricity | 2 | Active |
| US11145797B1 | Forming conformable layer with flap on semiconductor devices | Electricity | 2 | Active |
| US10323324B2 | Method for producing patterned metallic coatings | Chemistry; Metallurgy | 1 | Active |
| US10964867B2 | Using underfill or flux to promote placing and parallel bonding of light emitting diodes | Electricity | 1 | Active |
| US11655396B2 | Double-sided reversible adhesive structure | Chemistry; Metallurgy | 1 | Active |
| US12024656B2 | Moulded body comprising a structured surface for controlled adhesion | Chemistry; Metallurgy | 0 | Active |
| US10326040B1 | Washable mold for conformable layer formation on semiconductor devices | Electricity | 0 | Active |
| US10941035B2 | Method for producing structured surfaces | Emerging Cross-Sectional Technologies | 0 | Active |
| US11873849B2 | Shaped body having a structured surface for reversible adhesion | Chemistry; Metallurgy | 0 | Active |
| US10559486B1 | Method for polymer-assisted chip transfer | Electricity | 0 | Active |
| US10822697B2 | Method for producing metal structures | Emerging Cross-Sectional Technologies | 0 | Active |
| US10388516B1 | Method for polymer-assisted chip transfer | Electricity | 0 | Active |
| US10910514B1 | Molded etch masks | Electricity | 0 | Active |
| US12068443B1 | Forming conformable layer with flap on semiconductor devices | Electricity | 0 | Active |
| US11787982B2 | Structure with improved adhesion | Chemistry; Metallurgy | 0 | Active |
| US10763135B2 | Integrated elastomeric interface layer formation and singulation for light emitting diodes | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.