Michio Ohue
15Patents
10h-index
29Co-inventors
68Inventor score
Filing activity: Apr 13, 1989 → Mar 24, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5307304A | Semiconductor memory device and method of operation thereof | Electricity | 62 | Expired |
| US5211825A | Plasma processing apparatus and the method of the same | Electricity | 38 | Expired |
| US5496410A | Plasma processing apparatus and method of processing substrates by using same apparatus | Chemistry; Metallurgy | 32 | Expired |
| US5629888A | Semiconductor memory device and method of operation thereof | Electricity | 28 | Expired |
| US5745336A | Capacitor for semiconductor integrated circuit | Electricity | 21 | Expired |
| US5162633A | Microwave-excited plasma processing apparatus | Electricity | 18 | Expired |
| US5084355A | Laminar structure comprising organic material and inorganic material | Emerging Cross-Sectional Technologies | 17 | Expired |
| US5178962A | Metal-organic macromolecular synthetic resin composite and process for producing the same | Emerging Cross-Sectional Technologies | 16 | Expired |
| US5936832A | Semiconductor memory device and method of operation thereof | Electricity | 14 | Expired |
| US5434742A | Capacitor for semiconductor integrated circuit and method of manufacturing the same | Electricity | 13 | Expired |
| US5182495A | Plasma processing method and apparatus using electron cyclotron resonance | Electricity | 9 | Expired |
| US5347100A | Semiconductor device, process for the production thereof and apparatus for microwave plasma treatment | Electricity | 7 | Expired |
| US5107307A | Semiconductor device for control of light | Physics | 7 | Expired |
| US5233216A | Dielectric isolated substrate and process for producing the same | Electricity | 3 | Expired |
| US6940741B2 | Semiconductor memory device and methods of operation thereof | Electricity | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.