Munehiro Oota
6Patents
1h-index
18Co-inventors
40Inventor score
Filing activity: Dec 24, 2010 → May 29, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8853082B2 | Polishing liquid for CMP and polishing method using the same | Electricity | 14 | Active |
| US10155886B2 | Polishing liquid for CMP, and polishing method | Electricity | 1 | Active |
| US9564337B2 | Polishing liquid and method for polishing substrate using the polishing liquid | Electricity | 0 | Active |
| US9022834B2 | Polishing solution for CMP and polishing method using the polishing solution | Chemistry; Metallurgy | 0 | Active |
| US9966269B2 | Polishing liquid for CMP, polishing liquid set for CMP, and polishing method | Electricity | 0 | Active |
| US8592317B2 | Polishing solution for CMP and polishing method using the polishing solution | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.