Pascal Besson
7Patents
2h-index
15Co-inventors
44Inventor score
Filing activity: Dec 29, 2004 → Dec 17, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7250085B2 | Method of wet cleaning a surface, especially of a material of the silicon-germanium type | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7641738B2 | Method of wet cleaning a surface, especially of a material of the silicon-germanium type | Emerging Cross-Sectional Technologies | 2 | Active |
| US7491644B2 | Manufacturing process for a transistor made of thin layers | Electricity | 1 | Active |
| US8524522B2 | Microelectronic device, in particular back side illuminated image sensor, and production process | Electricity | 0 | Active |
| US11380543B2 | Method for fabricating a monocrystalline structure | Electricity | 0 | Active |
| US8759174B2 | Selective removal of a silicon oxide layer | Electricity | 0 | Active |
| US9831095B2 | Method for performing selective etching of a semiconductor material in solution | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.