Paul Edward Gee
12Patents
7h-index
25Co-inventors
66Inventor score
Filing activity: Apr 4, 1996 → Oct 11, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8664127B2 | Two silicon-containing precursors for gapfill enhancing dielectric liner | Electricity | 463 | Active |
| US7825038B2 | Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen | Electricity | 244 | Active |
| US5994209A | Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films | Electricity | 135 | Expired |
| US7994019B1 | Silicon-ozone CVD with reduced pattern loading using incubation period deposition | Electricity | 34 | Active |
| US6099647A | Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films | Electricity | 31 | Expired |
| US8236708B2 | Reduced pattern loading using bis(diethylamino)silane (C8H22N2Si) as silicon precursor | Electricity | 23 | Active |
| US6599574B1 | Method and apparatus for forming a dielectric film using helium as a carrier gas | Emerging Cross-Sectional Technologies | 8 | Expired |
| US8716154B2 | Reduced pattern loading using silicon oxide multi-layers | Electricity | 3 | Active |
| US8476142B2 | Preferential dielectric gapfill | Electricity | 2 | Active |
| US6153540A | Method of forming phosphosilicate glass having a high wet-etch rate | Electricity | 1 | Expired |
| US8012887B2 | Precursor addition to silicon oxide CVD for improved low temperature gapfill | Electricity | 0 | Active |
| US12315739B2 | Isotropic silicon nitride removal | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.