Rainer Pelzer
11Patents
1h-index
30Co-inventors
46Inventor score
Filing activity: Dec 4, 2012 → Oct 1, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10304782B2 | Compressive interlayer having a defined crack-stop edge extension | Electricity | 4 | Active |
| US11239188B2 | Terminal structure of a power semiconductor device | Electricity | 1 | Active |
| US8884407B2 | Devices for providing an electrical connection | Electricity | 0 | Active |
| US11276624B2 | Semiconductor device power metallization layer with stress-relieving heat sink structure | Electricity | 0 | Active |
| US11031321B2 | Semiconductor device having a die pad with a dam-like configuration | Electricity | 0 | Active |
| US10978395B2 | Method of manufacturing a semiconductor device having a power metallization structure | Electricity | 0 | Active |
| US10700019B2 | Semiconductor device with compressive interlayer | Electricity | 0 | Active |
| US11488921B2 | Multi-chip device, method of manufacturing a multi-chip device, and method of forming a metal interconnect | Electricity | 0 | Active |
| US11127693B2 | Barrier for power metallization in semiconductor devices | Electricity | 0 | Active |
| US10658309B2 | Semiconductor device with compressive interlayer | General | 0 | Revoked |
| US10734320B2 | Power metallization structure for semiconductor devices | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.